Control of the relief of the substrate SI (001) during thermal annealing in a vacuum chamber

 
PIIS054412690002766-9-1
DOI10.31857/S054412690002766-9
Publication type Article
Status Published
Authors
Affiliation: Institute of Semiconductor Physics. A.V. Rzhanova, Siberian Branch of the Russian Academy of Sciences
Address: Russian Federation
Affiliation: Institute of Semiconductor Physics. A.V. Rzhanova, Siberian Branch of the Russian Academy of Sciences
Address: Russian Federation
Affiliation: Institute of Semiconductor Physics. A.V. Rzhanova, Siberian Branch of the Russian Academy of Sciences
Address: Russian Federation
Affiliation: Novosibirsk State University
Address: Russian Federation
Journal nameMikroelektronika
EditionVolume 47 6
Pages407-413
Abstract

  

Keywords
Received08.12.2018
Publication date08.12.2018
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