Investigation of the Process of Plasma Through Etching of HkMG Stack of Nanotransistor with a 32-nm Critical Dimension

Myakonkikh, A. V.; Kuvaev, K. Yu.; Tatarintsev, A. A.; Orlikovskii,  N. A.; Rudenko , K. V.; Guschin, O. P.; Gornev, E. S.

doi:10.31857/S054412690001736-6

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Investigation of the Process of Plasma Through Etching of HkMG Stack of Nanotransistor with a 32-nm Critical Dimension

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Investigation of the Process of Plasma Through Etching of HkMG Stack of Nanotransistor with a 32-nm Critical Dimension

PII

S054412690001736-6-1

DOI

10.31857/S054412690001736-6

Publication type

Article

Status

Published

Authors

A. V. Myakonkikh

Affiliation: Institute of Physics and Technology, Russian Academy of Sciences
Address: Russian Federation

K. Yu. Kuvaev

Affiliation: Institute of Physics and Technology, Russian Academy of Sciences
Address: Russian Federation

A. A. Tatarintsev

Affiliation: Institute of Physics and Technology, Russian Academy of Sciences
Address: Russian Federation

N. A. Orlikovskii

Affiliation: Institute of Physics and Technology, Russian Academy of Sciences
Address: Russian Federation

K. V. Rudenko

Affiliation:
Address: Russian Federation

O. P. Guschin

Affiliation: Research Institute of Molecular Electronics (JSC “NIIME”)
Address: Russian Federation

E. S. Gornev

Affiliation: Research Institute of Molecular Electronics (JSC “NIIME”)
Address: Russian Federation

Journal name

Mikroelektronika

Edition

Volume 47 5

Pages

44-50

Abstract

Keywords

Publication date

28.10.2018

Number of characters

783

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GOST	Myakonkikh A., Kuvaev K., Tatarintsev A., Orlikovskii N., Rudenko K., Guschin O., Gornev E. Investigation of the Process of Plasma Through Etching of HkMG Stack of Nanotransistor with a 32-nm Critical Dimension // Mikroelektronika – 2018. – V. 47. – 5 C. 44-50 [Electronic resource]. URL: http://ras.jes.su/mikelek/s207987840000970-6-1-en (circulation date: 07.05.2024). DOI: 10.31857/S054412690001736-6
MLA	Myakonkikh, A. V., Kuvaev, K. Yu., Tatarintsev, A. A., Orlikovskii, N. A., Rudenko, K. V, Guschin, O. P., Gornev, E. S. "Investigation of the Process of Plasma Through Etching of HkMG Stack of Nanotransistor with a 32-nm Critical Dimension." Mikroelektronika 47.5 (2018):44-50. DOI: 10.31857/S054412690001736-6
APA	Myakonkikh A., Kuvaev K., Tatarintsev A., Orlikovskii N., Rudenko K., Guschin O., Gornev E. (2018). Investigation of the Process of Plasma Through Etching of HkMG Stack of Nanotransistor with a 32-nm Critical Dimension. Mikroelektronika 47(5), pp.44-50 DOI: 10.31857/S054412690001736-6

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