Plasma parameters and kinetics of active particles in CF4 (CHF3) + Ar mixtures of variable initial composition

 
PIIS054412690002767-0-1
DOI10.31857/S054412690002767-0
Publication type Article
Status Published
Authors
Affiliation: Federal State Budgetary Educational Institution of Higher Education “Ivanovo State University of Chemical Technology”
Address: Russian Federation
Affiliation: Korea University
Address: Korea
Affiliation: Federal State Budgetary Educational Institution of Higher Education “Ivanovo State University of Chemical Technology”
Address: Russian Federation
Journal nameMikroelektronika
EditionVolume 47 6
Pages414-423
Abstract

  

Keywords
Received08.12.2018
Publication date08.12.2018
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