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Radiation intensity profiles at various stages of apocampic discharge formation
 
PIIS004036440003561-1-1
DOI10.31857/S004036440003561-1
Publication type Article
Status Published
Authors
E. Sosnin 
Affiliation: National Research Tomsk State University
Address: Russian Federation
M. Andreev
Affiliation: Institute of High Current Electronics SB RAS
Address: Russian Federation
M. Didenko
Affiliation: Institute of High Current Electronics SB RAS
Address: Russian Federation
V. Panarin
Affiliation: Institute of High Current Electronics SB RAS
Address: Russian Federation
V. Skakun
Affiliation: Institute of High Current Electronics SB RAS
Address: Russian Federation
V. Tarasenko
Affiliation: Institute of High Current Electronics SB RAS
Address: Russian Federation
Journal nameTeplofizika vysokikh temperatur
EditionVolume 56 Issue 6
Pages859-864
Abstract

  

Keywords
AcknowledgmentThe work was performed as part of the state assignment of the ISE SB RAS on topic No. 13.1.4.
Received28.12.2018
Publication date28.12.2018
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