On the Effect of the Ratio of Concentrations of Fluorocarbon Components in a CF4 + C4F8 + Ar Mixture on the Parameters of Plasma and SiO2/Si Etching Selectivity

Publication type Article
Status Published
Address: Russian Federation
Affiliation: Korea University
Address: Korea, Republic of
Address: Russian Federation
Journal nameMikroelektronika
EditionVolume 47 4


Publication date15.10.2018
Number of characters740
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