On the Effect of the Ratio of Concentrations of Fluorocarbon Components in a CF4 + C4F8 + Ar Mixture on the Parameters of Plasma and SiO2/Si Etching Selectivity

 
PIIS054412690001644-5-1
DOI10.31857/S054412690001644-5
Publication type Article
Status Published
Authors
Affiliation:
Address: Russian Federation
Affiliation: Korea University
Address: Korea, Republic of
Affiliation:
Address: Russian Federation
Journal nameMikroelektronika
EditionVolume 47 4
Pages21-27
Abstract

   

Keywords
Received14.10.2018
Publication date15.10.2018
Number of characters740
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