O. P. Guschin

Research Institute of Molecular Electronics (JSC “NIIME”)

Title (en)	Readers community rating
Investigation of the Process of Plasma Through Etching of HkMG Stack of Nanotransistor with a 32-nm Critical Dimension (Mikroelektronika)	-

Journals editorials

Editrials contacts

Publisher/ Operator

Publishing LLC «Integration: Education and Science»

Developer

Publishing LLC «I-PC»