A. Efremov

Федеральное государственное бюджетное образовательное учреждение высшего образования

Title (en)	Readers community rating
On the Effect of the Ratio of Concentrations of Fluorocarbon Components in a CF4 + C4F8 + Ar Mixture on the Parameters of Plasma and SiO2/Si Etching Selectivity (Mikroelektronika)	-
Plasma parameters and kinetics of active particles in CF4 (CHF3) + Ar mixtures of variable initial composition (Mikroelektronika)	-

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